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NMC MOCVD System -
NMC MOCVD System
NMC MOCVD System
The features include five bubblers with individual cooling baths, heated gas lines, 950 °C platen, three gas rings, RF plasma source with Shower Head Gas Distribution and N2 flush at the end of the process, 5 10-7 Torr base pressure, 250 l/sec turbo pump with oil-free scroll pump, PC controlled, fully automated and safety interlocked.
Recently this technology has been extended to five 4” wafer stand alone batch system which can be integrated into a cluster configuration to meet high throughput production needs.
NMC-3000 TableTop System
- Application: Green LED’s (GaN, InGaN, AlGaN, ...) • 950 °C Platen, 2” Wafer
- 5 10-7 Torr Base Pressure
- PC Controlled with LabVIEW
- Recipe Driven, Password Protected • Fully Safety Interlocked
NMC-4000 Stand Alone System
- 14” Stainless Steel Cube Chamber
- One 6” Wafer with 8” Platen or Five 4” Wafers on 12” Platen • RF Plasma Source with Auto Tuner
- 1100 °C Platen, Rotating
- Manual or Automatic Wafer Loading and Unloading
- Compatible with Cluster Configuration
Tag: NMC MOCVD System
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